Thermal and UV Nanoimprint Device X-300
The X-300 is ideal for the development of advanced nanoimprint technology. It supports both thermal and UV processes with a 6-inch diameter and is characterized by high reproducibility.
From R&D to pilot production, we have addressed all stages, pursuing high quality, low cost, and high production efficiency. The X-300 is an ideal nanoimprint device for full-scale technology development. ■□■Features■□■ ■Processing method: Thermal, UV ■Processing size: Up to 100mm (Thermal φ150mm) ■Minimum displacement resolution: 50nm ■Pressing force: Maximum operating: 50kN ■Mold parallelism adjustment mechanism: Standard equipped ■Resist processing - Control possible with residual film below 5nm - Confirmed durability of 150,000 shots through mold technology development ■Film processing - Product manufacturing through practical lines (cell culture plates) - Capable of various pattern processing from nano to micron At SCIVAX, we provide various proposals for substrate processing using film and resist. Regarding LEDs, various optical elements (optical films), and various electronic devices, we will propose mass production processes tailored to your applications. For other functions and details, please contact the SCIVAX Microfabrication Division (Phone: 044-599-5051, Email: nil-contact@scivax.com).
